類別 | 系列代碼 | 波長(zhǎng)范圍nm | 反射率 | 直徑mm | 面型精度 | 表面質(zhì)量 | 損傷閾值 |
窄帶部分反射鏡 | PR1 | 190-2100 | 30-90% | 12.7-50.8 | λ/10 | 10-5 | 20 J/cm2, 20ns, 20Hz at 1064nm,
10 MW/cm2 at 1064nm |
窄帶可調(diào)全反鏡 | TLM1 | 190-2100 | R ≥ 99.0% at 0°
R ≥ 98.5% at 45°, P-Pol
R ≥ 99.0% at 45°, UNP
R ≥ 99.5% at 45°, S-Pol | 12.7-101.6 | λ/10 | 10-5 | 20 J/cm2, 20ns, 20Hz at 1064nm,
10 MW/cm2 at 1064nm |
光纖全反鏡 | FLM | 343, 515, 1030, 1064,
1070, 1550nm | R ≥ 99.0% at 0°
R ≥ 99.0% at 45°, UNP | 12.7-50.8 | λ/10 | 10-5 | 20 J/cm2, 20ns, 20Hz at 1064nm,
10 MW/cm2 at 1064nm |
準(zhǔn)分子全反鏡 | ARF | 193 | R ≥ 97% at 0°
R ≥ 96.0% at 45° UNP | 25.4-76.2 | λ/10 | 10-5 | 1 J/cm2, 20ns pulse at 193nm |
KRF | 248 | R ≥ 99.5% at 0°
R ≥ 99.0% at 45°, UNP | 25.4-76.2 | λ/10 | 10-5 | 3 J/cm2, 8ns pulse at 248nm |
YAG全反鏡 | Y5 | 213 | R ≥ 97.0% at 0°
R ≥ 97.0% at 45°, UNP | 12.7-50.8 | λ/10 | 10-5 | 3 J/cm2, 8ns pulse at 248nm |
Y4 | 262-266 | R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol | 12.7-101.6 | λ/10 | 10-5 | 10 J/cm2, 20ns, 20Hz at 266nm |
Y3 | 349-355 | R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol | 12.7-101.6 | λ/10 | 10-5 | 15 J/cm2, 20ns, 20Hz at 355nm |
Y2 | 523-532 | R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol | 12.7-101.6 | λ/10 | 10-5 | 20 J/cm2, 20ns, 20Hz at 532nm |
Y1 | 1047-1064 | R ≥ 99.9% at 0°
R ≥ 99.6% at 45°, P-Pol
R ≥ 99.8% at 45°, UNP
R ≥ 99.9% at 45°, S-Pol | 12.7-101.6 | λ/10 | 10-5 | 25 J/cm2, 20ns, 20Hz at 1064nm |
Y1S, Y2S, Y3S, Y4S | 266, 355, 532, 1064 | R ≥ 99.9% at 0°
R ≥ 99.9% at 45°, P-Pol
R ≥ 99.9% at 45°, S-Pol | 25.4 | λ/10 | 10-5 | 40 J/cm2, 20ns, 20Hz at 1064nm |
雙波長(zhǎng)反射鏡 | HM | 1064/532 | R ≥ 99% at 1064 and 532nm | 12.7-50.8 | λ/10 | 10-5 | 8 J/cm2, 20ns, 20Hz at 1064nm,
3 J/cm2, 20ns, 20Hz at 532nm |
YH | 1064/633 | R ≥ 99% at 1064nm
R ≥ 80% at 633nm | 25.4-50.8 | λ/10 | 10-5 | 8 J/cm2, 20ns pulse at 1064nm |
寬帶反射鏡 | TLM2 | 450nm to 2100nm | R > 99.5% at 0° incidence
R >99.0% at 45° incidence | 12.7-25.4 | λ/10 | 10-5 | 500 mJ/cm2, 20ns, 20Hz at 1064nm |
MPQ | 245 – 390 (UV)
420 – 700 (VIS) | Ravg≥ 98% from 245 – 390nm at 0° - 45°
Ravg≥ 98% from 420 – 700nm at 0° - 45° | 25.0 | λ/4 | 60-40 | 0.5 J/cm2, 10ns at 532nm |
鈦寶石超快反射鏡 | TLMB | 740 – 860 | R > 99.0% from 740 – 860nm | 25.0-101.6 | λ/10 | 40-20 | 8 J/cm2, 300 ps, 20Hz at 800nm |
金屬鍍膜反射鏡 | VUVA | 157 – 190 | R > 85% at 157nm by design | 25.4-50.8 | λ/10 | 40-20 | 低功率應(yīng)用 |
DUVA | 193 – 1200 | R > 90% at 193nm
Ravg≥ 85% at 400 – 1200nm | 12.7-50.8 | λ/10 | 40-20 |
PAUV | 250 – 600 | Ravg ≥ 85% (250 – 600nm) | 12.7-76.2 | λ/10 | 40-20 |
PAV | 400 – 800 | Ravg ≥ 87% (400 – 800nm) | 12.7-76.2 | λ/10 | 40-20 |
EAV | 450 – 650 | Ravg ≥ 92% (450 – 650nm) | 12.7-76.2 | λ/10 | 40-20 |
PS | 400 – 20,000 | Ravg ≥ 95% (400nm to 20 µm) | 12.7-76.2 | λ/10 | 40-20 |
PG | 650 – 20,000 | Ravg ≥ 95.5% (650 – 1700nm)
Ravg ≥ 98.0% (2 – 16 µm) | 12.7-76.2 | λ/10 | 40-20 |
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